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BRMUD

Recovery Mud Mask 110ml - By BRMUD

Recovery Mud Mask 110ml - By BRMUD

Regular price $19.00 USD
Regular price $19.00 USD Sale price $19.00 USD
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BRMUD Recovery Mud Mask – Deep Cleanse, Calm & Revitalize

Why You'll Love It
Refresh and purify your skin with the BRMUD Recovery Mud Mask, formulated with 30% Boryeong mud powder for powerful pore cleansing and oil control. Infused with soothing ingredients like Centella Asiatica, fig extract, tea tree oil, and Eclipta Prostrata, this mask calms irritation, reduces redness, and hydrates while improving texture. Perfect for sensitive skin, it promotes a radiant, clearer complexion without stripping moisture.

Key Benefits

  • Deep Cleansing: Removes sebum and impurities with Boryeong mud's mineral-rich formula.
  • Soothing Care: Calms irritated skin with Centella Asiatica and tea tree oil.
  • Hydration Boost: Creamy texture leaves skin clean and moisturized.
  • Pore Minimizing: Regular use reduces pore appearance and refines skin texture.
  • Sensitive Skin Friendly: Dermatologically tested for delicate skin.

How to Use

  1. After washing your face, pat dry.
  2. Apply an even layer of the mask using a brush or your hands, ensuring full coverage.
  3. Let it dry completely for 15-20 minutes.
  4. Gently roll off with your hands and rinse thoroughly with lukewarm water.

Ingredients

Purified water, cisilt (30%), glycerin, dipropylene glycol, bentonite (4%), kaolin (4%), betaine, 1,2-hexanediol, bottleweed extract, fig extract, kelp extract, Hanyeoncho leaf extract, Trurose of Yerico extract, mother and child extract, toad extract, toad extract, hostile leaf oil, hydrogene lecithin, xantan gum, polyacrylate-13, magnesium aluminum silicate, polyglyceryl-10 laurate, ethylhexylpalmitate, sorbitan isosteate, fructooligosaccharide, beta-glucan, hydrolized hyaluronic acid, tocopherol, butylene glycol, ethanol, lecithin, mastic gum, hydroxyacetophenone, mastic gum, hydroxyacetophenone, hydroxyhexylphenone, ethylhexylglyceride, chlorinated hyaluronic acid, beta-glucan, hydroxyacetophenone, ethylhexylglycerin


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